JPS6154211B2 - - Google Patents

Info

Publication number
JPS6154211B2
JPS6154211B2 JP54103851A JP10385179A JPS6154211B2 JP S6154211 B2 JPS6154211 B2 JP S6154211B2 JP 54103851 A JP54103851 A JP 54103851A JP 10385179 A JP10385179 A JP 10385179A JP S6154211 B2 JPS6154211 B2 JP S6154211B2
Authority
JP
Japan
Prior art keywords
photomask
mask
adhesive
glass
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54103851A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5629238A (en
Inventor
Koji Ishida
Akira Okazaki
Tomihiro Nakada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP10385179A priority Critical patent/JPS5629238A/ja
Publication of JPS5629238A publication Critical patent/JPS5629238A/ja
Publication of JPS6154211B2 publication Critical patent/JPS6154211B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/48—Protective coatings

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP10385179A 1979-08-15 1979-08-15 Photomask Granted JPS5629238A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10385179A JPS5629238A (en) 1979-08-15 1979-08-15 Photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10385179A JPS5629238A (en) 1979-08-15 1979-08-15 Photomask

Publications (2)

Publication Number Publication Date
JPS5629238A JPS5629238A (en) 1981-03-24
JPS6154211B2 true JPS6154211B2 (en]) 1986-11-21

Family

ID=14364936

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10385179A Granted JPS5629238A (en) 1979-08-15 1979-08-15 Photomask

Country Status (1)

Country Link
JP (1) JPS5629238A (en])

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6257260U (en]) * 1985-09-26 1987-04-09
JPS62288842A (ja) * 1986-06-09 1987-12-15 Tosoh Corp フオトマスク，レチクルの保護防塵体
JP3711063B2 (ja) 2001-11-08 2005-10-26 大日本印刷株式会社 防塵装置付きフォトマスク及びこれを用いた露光方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4063812A (en) * 1976-08-12 1977-12-20 International Business Machines Corporation Projection printing system with an improved mask configuration
US4131363A (en) * 1977-12-05 1978-12-26 International Business Machines Corporation Pellicle cover for projection printing system
JPS55121442A (en) * 1979-03-14 1980-09-18 Mitsubishi Electric Corp Photomask base plate
JPS55121443A (en) * 1979-03-14 1980-09-18 Mitsubishi Electric Corp Photomask base plate

Also Published As

Publication number Publication date
JPS5629238A (en) 1981-03-24

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